Ultrafast Polymerization Inhibition by Stimulated Emission Depletion for Three-
dimensional Nanolithography
Joachim Fischer and Martin Wegener
To identify the depletion mechanism in a stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.





Efficient Poling of Electro-Optic Polymers in Thin Films and Silicon Slot Waveguides by Detachable Pyroelectric Crystals

